概述

The PAS 5500/400C i-Line Step & Scan system has a variable NA (0.48 to 0.65) 4x projection lens, which combined with ASML’s AERIAL™ Illuminator provides 280nm resolution. ASML’s revolutionary Step & Scan stage technology enables users to take full advantage of the AERIAL™ Illumination intensity and advanced i-Line resists for throughputs of greater than 114 200mm wph. Long-term production overlay is less than 35nm. The PAS 5500/400C Step & Scan system’s resolution and productivity ensures the lowest operating cost for advanced i-Line lithography.