TWINSCAN AT:750T
概述
The TWINSCAN AT:750T was a KrF lithography system, using light with a wavelength of 248 nm and targeted production at the 130 nm node.
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The TWINSCAN AT:750T was a KrF lithography system, using light with a wavelength of 248 nm and targeted production at the 130 nm node.
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检验、保险、评估、物流