概述

The industry’s most productive lithography platform yet is the first to go beyond 300 wafers per hour. The TWINSCAN NXT:1470 193 nm step-and-scan system is the first ever “dry” lithography system built on our high-productivity, high-precision NXT platform. As a result, it is the first dry system to achieve on-product overlay better than 4.5 nm – and the first lithography machine of any kind capable of processing more than 300 wafers per hour.