概述

The TWINSCAN XT:1400Ei, 65-nm volume production using ArF immersion lithography is now a reality. In addition, this third-generation ‘wet’ tool lets you study 55-nm memory and 45-nm logic nodes as well as advanced techniques such as polarization. The XT:1400Ei with HydroLith immersion technology puts you at the forefront of developments that will take optical lithography to the edge of extreme ultraviolet (EUV).