说明
无说明配置
The cymer laser is EOL. Asset Description: 193nm ASML Immersion scanner Software Version: 5.1 CIM: SECS Process: 40/45nm backend Main System main body 1 OK CYMER laser 1 OK MCWC 1 OK main body 1 OK WISR 1 OK WICR 1 OK flter cabinet 1 OK LCWC 1 OK ACC 1 OKOEM 型号描述
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.文件
无文件
ASML
TWINSCAN XT:1900Gi
已验证
类别
Steppers & Scanners
上次验证： 16 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
105053
晶圆尺寸：
12"/300mm
年份：
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1900Gi
类别
Steppers & Scanners
上次验证： 16 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
105053
晶圆尺寸：
12"/300mm
年份：
2009
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
The cymer laser is EOL. Asset Description: 193nm ASML Immersion scanner Software Version: 5.1 CIM: SECS Process: 40/45nm backend Main System main body 1 OK CYMER laser 1 OK MCWC 1 OK main body 1 OK WISR 1 OK WICR 1 OK flter cabinet 1 OK LCWC 1 OK ACC 1 OKOEM 型号描述
The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.文件
无文件