跳至主要内容
Moov logo

Moov Icon
ASML TWINSCAN XT:1900Gi
    说明
    (1) Main System (1) CYMER laser (1) MCWC (1) main body (1) WISR (1) WICR (1) Filter cabinet (1) LCWC (1) ACC
    配置
    The cymer laser is EOL. -193nm ASML Immersion scanner -SW Version: 5.1 -SECS -40/45nm backend
    OEM 型号描述
    The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.
    文件
    类别
    Steppers & Scanners

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    105053


    晶圆尺寸:

    12"/300mm


    年份:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    ASML

    TWINSCAN XT:1900Gi

    verified-listing-icon
    已验证
    类别
    Steppers & Scanners
    上次验证: 60 多天前
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/13ac333a987642f4a4bdd6b44b0bb473_c302b0aabbe6472a98bb87646ecc0f391201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/5fa191f9d0224d35b23636871bd01b11_cd74f47b816b43ef91be208953c707751201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/9318b64de9dd4003a5b73d45f8059a2a_8a6ef44367664167aecd28db89accd6f1201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/fae93219e83a412a988bef863f46a6ef_b5b3e2ddf3874ea5b3658d809d31e49e1201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/2e9bc82132514f44b1c9d2616be13792_44853d704610440ab58a5ec8d69fd22f1201a_mw.jpeg
    listing-photo-a4ea2fd8eac340cda7a64ae78c834e96-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/52814/a4ea2fd8eac340cda7a64ae78c834e96/80af2d6360614e7d90bb70ca216ce786_8c8e5cc6278e4ceb9328b644c96fc551_mw.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    105053


    晶圆尺寸:

    12"/300mm


    年份:

    2009


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    (1) Main System (1) CYMER laser (1) MCWC (1) main body (1) WISR (1) WICR (1) Filter cabinet (1) LCWC (1) ACC
    配置
    The cymer laser is EOL. -193nm ASML Immersion scanner -SW Version: 5.1 -SECS -40/45nm backend
    OEM 型号描述
    The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below.
    文件