Stepper. NSR-S203B (resolution ≦ 180 nm). Ability to mass manufacture ICs with ultra-high-precision circuitry–specifically, sub-0.18µm minimum-pattern linewidth. 

Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

NIKON

NSR-S203B

Lens Data
IU Flare = 0.84%
Lens Flare = 8.50%
Uniformity = 6.00%
Power = 541 mW/cm2
Total Focus Deviation = 0.202 µm
Astigmatism = 0.119 µm
Coma = 0.040 µm
Iso DOF = .275 µm

Photolithography Scanner 248nm
Software Version - MCSV
CIM - SECS

Excluded Items List (Pumps, Chillers & Abatement are all excluded)

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Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.


NSR-S203B

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