说明
无说明配置
-Software Version: 2.04c -CIM: SECS -Process: Film thickness measurement System Type Description Quantity Status Factory Interface SMIF 2 OK Handler System Robot 1 OK Options System Server 1 OK Main System Main body 1 OKOEM 型号描述
The Opti-Probe 3260 (OP-3260) is a metrology tool developed by Therma-Wave that offers a 30% increase in productivity. It has the same thick and thin film measurement capabilities as the original Opti-Probe, making it the only choice for measuring TiN t, n, and k in the UV range down to 190nm. The OP-3260 also features better robotics, Pentium-speed processing, a spectrometric light source that can be changed in 15 minutes without optics recalibration, and the surest pattern recognition in the business. These improvements result in a significant jump in productivity, making it easier to turn out more wafers.文件
无文件
KLA / THERMA-WAVE
OP-3260
已验证
类别
Thin Film / Film Thickness
上次验证： 10 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
118007
晶圆尺寸：
8"/200mm
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA / THERMA-WAVE
OP-3260
类别
Thin Film / Film Thickness
上次验证： 10 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
118007
晶圆尺寸：
8"/200mm
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
-Software Version: 2.04c -CIM: SECS -Process: Film thickness measurement System Type Description Quantity Status Factory Interface SMIF 2 OK Handler System Robot 1 OK Options System Server 1 OK Main System Main body 1 OKOEM 型号描述
The Opti-Probe 3260 (OP-3260) is a metrology tool developed by Therma-Wave that offers a 30% increase in productivity. It has the same thick and thin film measurement capabilities as the original Opti-Probe, making it the only choice for measuring TiN t, n, and k in the UV range down to 190nm. The OP-3260 also features better robotics, Pentium-speed processing, a spectrometric light source that can be changed in 15 minutes without optics recalibration, and the surest pattern recognition in the business. These improvements result in a significant jump in productivity, making it easier to turn out more wafers.文件
无文件