跳至主要内容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多

Moov logo

Moov Icon
KLA ASET-F5x
  • KLA ASET-F5x
  • KLA ASET-F5x
  • KLA ASET-F5x
说明
Film Thickness Measurement System
配置
无配置
OEM 型号描述
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.
文件

无文件

verified-listing-icon

已验证

类别
Thin Film / Film Thickness

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

71456


晶圆尺寸:

12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

ASET-F5x

verified-listing-icon
已验证
类别
Thin Film / Film Thickness
上次验证: 60 多天前
listing-photo-b398b5d4009a43c2abb438ca30263630-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

71456


晶圆尺寸:

12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Film Thickness Measurement System
配置
无配置
OEM 型号描述
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.
文件

无文件