说明
无说明配置
无配置OEM 型号描述
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.文件
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KLA
ASET-F5x
已验证
类别
Thin Film / Film Thickness
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
116454
晶圆尺寸：
未知
年份：
2023
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KLA
ASET-F5x
类别
Thin Film / Film Thickness
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
116454
晶圆尺寸：
未知
年份：
2023
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.文件
无文件