说明
Substrate Cleaning System配置
无配置OEM 型号描述
The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.文件
无文件
ULTRA-T EQUIPMENT / UTE
SCSe124
已验证
类别
Wafer Scrubber
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
78197
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULTRA-T EQUIPMENT / UTE
SCSe124
类别
Wafer Scrubber
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
78197
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Substrate Cleaning System配置
无配置OEM 型号描述
The highly efficient Model SCSe124 is the ideal solution for submicron cleaning of Photomasks, Wafers and Substrates. The very reliable and cost effective system utilizes proven assortment of cleaning technologies. The SCSe124 can be configured with several different cleaning options form High Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies and Nozzles, and much more. The Rapid and Effective Drying technique combines Variable Spin Speeds optional Heated DI, Nitrogen Assist or Heat Lamp. The SCSe124 has a Microprocessor Controller allowing variable process parameters and retention of up to (10) ten process programs in memory.文件
无文件