概述

The FC-3000 is the leading-edge single bath wet station for the next-generation 300 mm wafer cleaning. It is a combination of the best cleaning technologies taken from the WS-620/820 multi-bath wet station series and the ultra-clean processing capability of the F-WET single bath wet station series. This powerful combination of technologies allows you to obtain optimal cleaning results with both concentrated and dilute chemistries in a smaller, fixed footprint design. The FC-3000 has built-in tools such as the schedule optimization function which allows you to easily monitor equipment productivity indices such as throughput rate and Cost-of-Ownership information such as chemical/DI water consumption, enabling low C.O.O. and stable processing.