概述

The FC-821L is a single-bath cleaning system that integrates our finest chemical circulation cleaning technologies, perfected in our renowned multi-bath Wet Stations. It is an unprecedentedly efficient system that incorporates a low-pressure dryer to prevent water mark generation during the drying processes. The FC-821L meets all the rigorous challenges of next-generation cleaning by realizing quarter-micron processing with accelerated throughput yet reduced chemical consumption. By decreasing cleaning units, as in the popular FS-820L, we can offer compact designs and radical space savings than previous multi-bath systems. Installing the FC-821L directly adjoining the next process equipment significantly slashes space demands in limited clean room environments. Moreover, the consequent minimized wafer transfer between processings greatly inhibits the generation of native oxides and other contamination.