说明
无说明配置
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:60 AMPS60 AMPS Recommended Packaging Form:CUSTOM PALLETCUSTOM PALLET Dimensions: StandardMetric Overall:51 x 81 x 80 IN - 3000 LBS1295.40 x 2057.40 x 2032.00 mm - 1360.80 kgOEM 型号描述
The Spray Acid Tool (SAT) is a versatile tool that offers a range of cleaning, etching, and stripping capabilities. It features a multichamber design that allows for safe and economical operation in a completely closed environment. The SAT is 300mm ready, meaning it can handle wafers of that size. Some of the specific applications of the SAT include post-CMP clean, photo-resist strip, polymer removal, pre-diffusion clean, monitor wafer clean, and metal etch. These processes are essential for the preparation and maintenance of semiconductor wafers during the manufacturing process.文件
无文件
SEMITOOL
SAT
已验证
类别
Wet processing
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
39654
晶圆尺寸：
未知
年份：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEMITOOL
SAT
已验证
类别
Wet processing
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
39654
晶圆尺寸：
未知
年份：
2004
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Voltage:208 VOLTS208 VOLTS Frequency:50/60 HERTZ50/60 HERTZ Phase:33 Current:60 AMPS60 AMPS Recommended Packaging Form:CUSTOM PALLETCUSTOM PALLET Dimensions: StandardMetric Overall:51 x 81 x 80 IN - 3000 LBS1295.40 x 2057.40 x 2032.00 mm - 1360.80 kgOEM 型号描述
The Spray Acid Tool (SAT) is a versatile tool that offers a range of cleaning, etching, and stripping capabilities. It features a multichamber design that allows for safe and economical operation in a completely closed environment. The SAT is 300mm ready, meaning it can handle wafers of that size. Some of the specific applications of the SAT include post-CMP clean, photo-resist strip, polymer removal, pre-diffusion clean, monitor wafer clean, and metal etch. These processes are essential for the preparation and maintenance of semiconductor wafers during the manufacturing process.文件
无文件