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TEL / TOKYO ELECTRON UW-200Z
    说明
    Batch Wafer Processing
    配置
    无配置
    OEM 型号描述
    The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.
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    TEL / TOKYO ELECTRON

    UW-200Z

    verified-listing-icon

    已验证

    类别

    Wet processing
    上次验证: 19 天前
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    52997


    晶圆尺寸:

    8"/200mm


    年份:

    2003

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    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
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    TEL / TOKYO ELECTRON UW-200Z
    TEL / TOKYO ELECTRONUW-200ZWet processing
    年份: 2003状况: 二手
    上次验证19 天前

    TEL / TOKYO ELECTRON

    UW-200Z

    verified-listing-icon

    已验证

    类别

    Wet processing
    上次验证: 19 天前
    listing-photo-f70a89999e17457a82ac1554f0f746b5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    52997


    晶圆尺寸:

    8"/200mm


    年份:

    2003


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Batch Wafer Processing
    配置
    无配置
    OEM 型号描述
    The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.
    文件

    无文件

    类似上架物品
    查看全部
    TEL / TOKYO ELECTRON UW-200Z
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