The Xradia Ultra family comprises of Xradia 800 Ultra, operating at 8 keV photon energy, and Xradia 810 Ultra, operating at 5.4 keV. In general, lower energy X-rays are absorbed more strongly and therefore will provide you with higher contrast for most materials. Thus, as long as transmission remains sufficient, you will experience resulting image quality and/or throughput that are greatly improved with Xradia 810 Ultra. For materials of higher density, or thick specimens Xradia 800 Ultra delivers higher photon energy for (typically) more transmission. 

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

XRADIA 810 ULTRA

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