跳至主要内容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多

Moov logo

Moov Icon
AXCELIS / FUSION FUSION ES3
  • AXCELIS / FUSION FUSION ES3
  • AXCELIS / FUSION FUSION ES3
  • AXCELIS / FUSION FUSION ES3
说明
Process chamber
配置
无配置
OEM 型号描述
The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.
文件

无文件

类别
Ashers / Plasma Cleaner

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

111693


晶圆尺寸:

12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AXCELIS / FUSION

FUSION ES3

verified-listing-icon
已验证
类别
Ashers / Plasma Cleaner
上次验证: 60 多天前
listing-photo-ba0c5f8112df4fc8920aaeebf126e556-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

111693


晶圆尺寸:

12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Process chamber
配置
无配置
OEM 型号描述
The FusionES3 is a 300mm plasma asher with dry strip capabilities, designed for post-implant and post-etch process steps. It has a flexible process architecture, making it suitable for conventional and dual damascene process flows. It provides dry resist and residue removal, and its elevated ash rate delivers high throughput and productivity. The tool is designed to run oxidizing, fluorinated, and reducing chemistries. Its unique dual-chamber platform enables dry strip and residue removal to be performed within a single chamber, increasing productivity and reducing the system footprint.
文件

无文件