说明
System controller (CPU board, AI/O board, DI/O board) RF generator rack (RF bias generator, RF source generator) Process chamber (RF bias matcher)配置
IRIDIAOEM 型号描述
The PEP IRIDIA is an advanced cleaning system designed for sub-0.18-micron 200mm wafer applications. The IRIDIA’s modular architecture allows manufacturers to configure the system for both front and back-end-of-line cleaning applications down to 90 nanometer device geometries. Targeted at critical steps in copper and low-k manufacturing processes, the IRIDIA offers the highest productivity of any 200mm dry-clean system currently on the market.文件
无文件
LAM RESEARCH / NOVELLUS / GASONICS
PEP IRIDIA
已验证
类别
Ashers / Plasma Cleaner
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
92134
晶圆尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH / NOVELLUS / GASONICS
PEP IRIDIA
类别
Ashers / Plasma Cleaner
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
92134
晶圆尺寸:
未知
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
System controller (CPU board, AI/O board, DI/O board) RF generator rack (RF bias generator, RF source generator) Process chamber (RF bias matcher)配置
IRIDIAOEM 型号描述
The PEP IRIDIA is an advanced cleaning system designed for sub-0.18-micron 200mm wafer applications. The IRIDIA’s modular architecture allows manufacturers to configure the system for both front and back-end-of-line cleaning applications down to 90 nanometer device geometries. Targeted at critical steps in copper and low-k manufacturing processes, the IRIDIA offers the highest productivity of any 200mm dry-clean system currently on the market.文件
无文件