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LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100
    说明
    ASHER
    配置
    ASHER
    OEM 型号描述
    The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.
    文件

    无文件

    类别
    Ashers / Plasma Cleaner

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    111882


    晶圆尺寸:

    8"/200mm


    年份:

    2002


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    LAM RESEARCH / NOVELLUS / GASONICS

    GAMMA 2100

    verified-listing-icon
    已验证
    类别
    Ashers / Plasma Cleaner
    上次验证: 60 多天前
    listing-photo-738bd4ed38aa4b9db2f459e32a2fd207-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    111882


    晶圆尺寸:

    8"/200mm


    年份:

    2002


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    ASHER
    配置
    ASHER
    OEM 型号描述
    The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.
    文件

    无文件