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LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
说明
无说明
配置
无配置
OEM 型号描述
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
文件
类别
Ashers / Plasma Cleaner

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

54398


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS / GASONICS

L3510

verified-listing-icon
已验证
类别
Ashers / Plasma Cleaner
上次验证: 60 多天前
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listing-photo-28025da0782343cbaf79c06df8fcd388-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/47655/28025da0782343cbaf79c06df8fcd388/1a5557f2d019486a8c6b1a832a95e1e6_b53663b79a1d4949a99be4585b40923345005c_mw.jpeg
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物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

54398


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
无配置
OEM 型号描述
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
文件
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