说明
GASONIC L3510 Single Wafer Downstream Photoresist Asher配置
8” configured (can change to 6”) Quartz Plasma Tube and Baffles ASTEX Microwave 1.2kw Temperature Controlled Wafer Cooled Aluminum Process Chamber Robotic Pick and Place Wafer Handler ( KORO ) Fixed Position Single Cassette Station Downstream End Point Detection SEMI SECS ⅱ Software 2 Gas Mass Flow Controller : O2 4slpm , N2 2slpm System Power : 208 VAC , 60 A, 3 Phase, 50/60HzOEM 型号描述
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.文件
LAM RESEARCH / NOVELLUS / GASONICS
L3510
已验证
类别
Ashers / Plasma Cleaner
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
82160
晶圆尺寸：
8"/200mm
年份：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS / GASONICS
L3510
类别
Ashers / Plasma Cleaner
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
82160
晶圆尺寸：
8"/200mm
年份：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available