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ULVAC NA-8000
    说明
    NA 8000 Ashing
    配置
    无配置
    OEM 型号描述
    The NA-8000 is a versatile ashing system that can remove anything from organic film to oxide film to SiN. It has a high dose ion implant stripping process and polymer removal process of 10E + 16 or higher level, necessary for critical processes for next-generation wafers. The chamber construction is arranged most suitably for an F-based gas addition process, allowing for particle-free treatment. The system construction is simple, achieving excellent maintainability and reliability, and low cost at the same time. It also allows for flexible system construction (μ wave, RIE, and μ wave + RIE) and easy wafer size change by simply changing the recipe setting. Overall, the NA-8000 is a powerful tool for removing anything and everything from your wafers.
    文件

    无文件

    ULVAC

    NA-8000

    verified-listing-icon

    已验证

    类别
    Ashers / Plasma Cleaner

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    72903


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    ULVAC NA-8000

    ULVAC

    NA-8000

    Ashers / Plasma Cleaner
    年份: 0状况: 二手
    上次验证60 多天前

    ULVAC

    NA-8000

    verified-listing-icon
    已验证
    类别
    Ashers / Plasma Cleaner
    上次验证: 60 多天前
    listing-photo-7e8fa06c83af48a1859661431b0abac0-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    72903


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    NA 8000 Ashing
    配置
    无配置
    OEM 型号描述
    The NA-8000 is a versatile ashing system that can remove anything from organic film to oxide film to SiN. It has a high dose ion implant stripping process and polymer removal process of 10E + 16 or higher level, necessary for critical processes for next-generation wafers. The chamber construction is arranged most suitably for an F-based gas addition process, allowing for particle-free treatment. The system construction is simple, achieving excellent maintainability and reliability, and low cost at the same time. It also allows for flexible system construction (μ wave, RIE, and μ wave + RIE) and easy wafer size change by simply changing the recipe setting. Overall, the NA-8000 is a powerful tool for removing anything and everything from your wafers.
    文件

    无文件

    类似上架物品
    查看全部
    ULVAC NA-8000

    ULVAC

    NA-8000

    Ashers / Plasma Cleaner年份: 0状况: 二手上次验证:60 多天前