Hitachi High-Tech offers a range of advanced industrial equipment solutions for assembly and processing machines used in the production of lithium batteries, auto parts and advanced film. Also offered R&D equipment necessary for the development of FC, organic materials, and catalyst materials.

The CV5000 is an advanced High Voltage CD-SEM (Critical Dimension-Scanning Electron Microscope) series launched on October 13, 2016. Designed to meet the evolving needs of semiconductor device manufacturing, the CV5000 excels in measuring High Aspect Ratio (HAR) trenches and contact holes. With the integration of a 30 kV electron gun and a specialized detection system, it can adeptly detect secondary and backscattered electrons, enabling precise measurements even at the bottom of deep trenches with aspect ratios exceeding 40.

HITACHI

CV5000

HITACHI S 9220S is a SEM & TEM system. The S 9220S can produce a 6" or 8" wafer size.

S-9220S

S-9300T

S-6280

S-9830

The CS4800 provides high-quality SEM imaging, improved measurement precision, and fast, automated operation, designed to improve productivity and operating efficiency of existing manufacturing lines and increase customer's process control capability. In addition, the CS4800 can be configured to handle two different wafer sizes that can be switched by the customer using to a new wafer-transfer system. 

CS4800

S-7280H

The Advanced CD Measurement SEM CG6300 (HITACHI CD-SEM) will offer higher resolution with a fully renewed electron optical system along with improved metrology repeatability and image quality. The electron microscope column is able to select secondary electrons and backscattered electrons emitted from the material depending on the measurement target. In this way, CD-SEM: CG6300 is able to measure the bottom dimensions of deep trenches and holes in via-in-trench*1 BEOL process*2 as well as 3D NAND and DRAM.

CG6300

CG5000 is designed to meet the needs for higher accuracy and versatility in development and manufacturing processes of new generation semiconductor devices. Hitachi High-Tech achieved new records*2 for throughput and metrology accuracy repeatability with the CG5000 by redesigning the transfer system and employing improved electron optics and image processing technologies.  

CG5000

S-9200SA

S-8640 high-resolution critical-dimension measurement scanning electron microscopes (CD-SEMs) capable of handling 300-mm wafers.   

S-8640

Hitachi High-Technologies introduced the "CV6300 Series," an advanced successor to the CV5000 Series, designed for deep hole and trench measurements in 3D-NAND flash memory manufacturing, especially for structures with 96 layers and beyond. This high voltage CD-SEM system boasts a world-first 45kV acceleration voltage, offering high-resolution imaging and precise overlay measurements. With improved throughput and precision, the CV6300 Series aims to enhance semiconductor manufacturing productivity.

CV6300

S-8800

S-7800H

S-7280

The S-6000 was Hitachi's pioneering CD-SEM system for micro-scale dimensional measurement of semiconductors. Developed through a collaboration between Hitachi's electron microscope and semiconductor divisions, it aimed to provide a comprehensive measurement solution rather than just hardware. Designed with user-centric features, it eliminated the need for a dark room and offered easy calibration. Adopted globally by semiconductor manufacturers, the S-6000 set a new standard in semiconductor measurement, ensuring high reliability, accuracy, and user-friendliness.

S-6000

CG4500

S-8820S

The CG7300 provides enhanced high-precision measurement and improved throughput performance. The tool is based on a "common platform concept" that has been extended from previous model CG6300. This model is geared toward mass production of 5nm generation devices and development of 3nm generation devices for EUV*2 Lithography.

CG7300

S-8600

S-6180

"The GS1000 by Hitachi High-Tech is an advanced SEM (Scanning Electron Microscopy) tool designed for large FOV area inspection. It uniquely combines high-speed scanning with a large-current electron beam, ensuring high-resolution imaging of 80um x 80um with exceptional in-image uniformity accuracy of less than 0.02%. The system is adept at correlating multiple processes and analyzing yields by comparing SEM images with design data.

GS1000

CG 6450T

The Hitachi S-9220 CD-SEM is a high-resolution, automated tool for precise CD measurements. It is designed for inline process control and development in semiconductor manufacturing. With programmable addressing and pattern recognition, it accurately measures various structures. It supports 6-inch and 8-inch wafer loading and provides easy data access via Hitachi software and a Data Station. The S-9220 CD-SEM is an essential tool for semiconductor manufacturers, offering superior resolution and automation for reliable CD measurements.

S-9220

High-resolution critical-dimension measurement scanning electron microscopes (CD-SEMs)

S-8840

20 (automatic operation) (6-inch wafer, 5-point measurement)
wafer sizes: 5, 6, 8

S-8820

The CG4100 is a high-throughput instrument for 32-nm process production and 22-nm process development which was designed to meet the measurement needs of the latest generation of double patterning techniques.

CG4100

The CG4000 is a cutting-edge solution for process applications, offering advanced functions that enhance both precision and efficiency. Its high-accuracy averaged CD (ACD) metrology function improves repeatability and throughput, while its industry-standard line edge roughness (LER) measurement function contributes significantly to process monitoring. These features make the CG4000 an essential tool for maintaining high standards in process applications.

CG4000

S-8620

S-7800

S-7840 review SEM has been incorporated with (1) ADR (automatic defect review) and ADC (automatic defect classification), (2) data interface with various inspection equipment, (3) an interface which transfers review results with SEM images showing the defects to an advanced data analysis system, and (4) defect sampling function which allows selection of type of defects for reviewing.

S-7840

The Hitachi Model S-9260 CD-SEM system has been developed to meet the requirements of these new fabrication processes. Having the following features, it can provide a CD measurement environment suitable for fabricating next-generation semiconductor devices: (1) Excellent observation performance based on the electron optical design common in the S-9000 Series, (2) Enhanced CD measurement reproducibility, throughput, and other basic performance capabilities, (3) Improved process-variation monitoring, (4) Instrument performance maintenance/control support functions, and (5) New process application functions such as those for beam-tilt observations, surface charged-specimen measurements, and ArF-resist measurements.

S-9260

S-6200H

The S-9300 is standard equipped with a laser interferometer stage for ultra-high target addressing precision, mini-environment and FOUP compatible loadports. Advanced automation scenarios like FOUP delivery by automatic material handling systems (AMHS) and single wafer identification can be supported.

S-9300

The S-9380 is Hitachi’s most advanced CD-measurement SEM developed for 65 nm process control of semiconductor devices on wafers up to 300 mm in diameter. With improvement in both hardware and software, the S-9380 supports a high throughput of 33 wafers per hour with 20 measurement points per wafer, and resolution of 2.0 nm.

S-9380

The electron optical system of the Model S-9260 CD-SEM has a 3-nm image resolution, which is applicable to lines/spaces and hole patterns of less than
0.1 µm. Figs. 2 and 3 show examples of observations of the model. It has formula-editor and beam-tilt observation functions
that enable detecting process variations early and controlling them easily.

S-9260A

Hitachi High-Technologies Corporation has launched DESIGNGAUGE, a mask design data measuring system aimed at improving efficiency and production yield in semiconductor device design and development. DESIGNGAUGE accurately collates and compares mask pattern design data with circuit pattern image data on the wafer, obtained through a critical dimension scanning electron microscope (CD-SEM). It enables the creation of measurement recipes offline that were previously only possible with a CD-SEM, allowing remote control of the CD-SEM to automatically align mask pattern design data with the wafer's test pattern. This significantly streamlines the data acquisition process for creating an optical proximity correction (OPC) model, reducing the time required compared to conventional techniques. Hitachi High-Tech is committed to further enhancing the accuracy and capabilities of DESIGNGAUGE and developing DFM-based measuring technologies to meet evolving metrology needs.

S-9380 II

S-6100

S-6200

CD Measurement Scanning Electron Microscope
S-6280H, 8 wafers per hour with single cassette, 15 wafers per hour with double cassette.

S-6280H

The Hitachi S-9360 Advanced CD-Measurement SEM has been developed for the sub-100 nm process control of semiconductor devices. It is compatible with 200- and 300-mm wafers, ArF photoresist wafers, as well as other charge sensitive wafers. It has a new automated column alignment function and a new built-in Hitachi real-time process monitor, which keeps track of process conditions at all times. These new features make the S-9360 the best available CD-SEM for a wide range of applications. The S-9360 is not only an R&D tool but also a next-generation mass production tool for the semiconductor industry.

S-9360

The Hitachi S-9200 CD SEM "45 (automatic operation)" is a high-precision scanning electron microscope designed for critical dimension (CD) measurements on semiconductor wafers. It supports 6-inch and 8-inch wafer sizes, making it versatile for various production environments. With its automated operation, it ensures consistent and reliable results while reducing human error. The CD SEM utilizes a focused electron beam to capture high-resolution images, enabling detailed analysis of patterns, line widths, and structural characteristics. Equipped with a 5-point measurement system, it allows for accurate and repeatable measurements across the wafer. The S-9200 CD SEM is an essential tool for semiconductor manufacturers, enabling precise CD measurements and optimization of production processes. Its advanced technology and automation capabilities make it an invaluable asset in quality control and process development.

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

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GS1000

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S-9220S

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