概述

The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the 65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.