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说明
无说明配置
无配置OEM 型号描述
The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the 65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.文件
无文件
KLA
eCD-1
类别
CD-SEM
上次验证： 15 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
126101
晶圆尺寸：
未知
年份：
未知
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说明
无说明配置
无配置OEM 型号描述
The eCD 1— unveiled in February 2003—features the precision and resolution to meet the CD metrology performance requirements for the 90-nm technology node and beyond. The eCD 1 is based on a new platform, and all its design aspects have been precision suited for 90-nm node metrology requirements, and extendible to the 65-nm node. eCD 1 is well suited for applications involving 193-nm lithography and very-high-aspect-ratio structures.文件
无文件