说明
无说明配置
Performance Specification: • Feature Size: < 100 nm • Resolution: < 4.5 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 40 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM 型号描述
KLA, a leading company in the field of metrology, has invested heavily in engineering and manufacturing to develop its next-generation tool, the KLA 8100. This advanced E-Beam metrology system builds on the success of KLA’s first-generation tool, which boasted high throughput and an automated setup process. The KLA 8100 promises to be even more advanced, making it an attractive option for manufacturers.文件
无文件
KLA
8100
已验证
类别
CD-SEM
上次验证： 5 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
117149
晶圆尺寸：
未知
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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KLA
8100
类别
CD-SEM
上次验证： 5 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
117149
晶圆尺寸：
未知
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Performance Specification: • Feature Size: < 100 nm • Resolution: < 4.5 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 40 wafers/hr Configured as follows: • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • MAC OS, user friendly interface • 3 wafer loading stations (each station can run multiple size wafers) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM 型号描述
KLA, a leading company in the field of metrology, has invested heavily in engineering and manufacturing to develop its next-generation tool, the KLA 8100. This advanced E-Beam metrology system builds on the success of KLA’s first-generation tool, which boasted high throughput and an automated setup process. The KLA 8100 promises to be even more advanced, making it an attractive option for manufacturers.文件
无文件