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说明
无说明配置
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM 型号描述
未提供文件
无文件
KLA
8100XPR
类别
CD-SEM
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
117151
晶圆尺寸：
未知
年份：
1999
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说明
无说明配置
Performance Specification: • Feature Size: < 30 nm • Resolution: < 4 nm • Electron Source: Schottky, Thermal Field Emitter • Magnification: 2.34 kX - 400 kX • Stage: X-Y leadscrew stage, Position Accuracy < 10 micron • Accelerating Voltage: 0.4kV - 1.5kV • Throughput: upto 50 wafers/hr Configured as follows: • 1 or 2 Reticle loading stations, 1 or 2 wafer cassette loading stations • Reticle size: 5" or 6" square • Wafer size: 3” – 8” (Si, GaAs, Sapphire, SiC, etc) • Windows XP or MAC OS, user friendly interface • 1 or 2 wafer loading stations (each can run multiple sizes) • Chamber pump: Edwards or Varian dry scroll pump • Load lock pump: Edwards or Varian dry scroll pump • Dedicated UPS system for emergency power back up • Power: 120V-220VAC, 1PH, 50/60HZOEM 型号描述
未提供文件
无文件