KLA inhabits two worlds: one that’s nanometers in scale and one that’s global. This micro and macro view gives us a unique perspective. We see electrons wave and industries transform. When you put deep science together with optimism, big things happen.

Our process-control and process-enabling solutions are designed to boost the innovation speed of the electronics industry. We help our customers achieve leading-edge performance.

The Archer AIM+ is an advanced optical overlay metrology tool that sets the standard for lithography process control through the > 45-nm node. It improves yield and cost of ownership with a 20% increase in throughput over previous-generation solutions. It features field-proven AIM grating-style technology, improved optics design, and high accuracy measurements. Its applications include overlay metrology, CMP, lithography, and wafer surface focus and analysis.

KLA

ARCHER AIM+

Overlay

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Overlay

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