说明
无说明配置
无配置OEM 型号描述
Laboratory Spin Coat and Develop Solution for Wafers up to 150 and 200mm SUSS MicroTec‘s LabSpin platform represents the next generation of manual spin coater and developer systems that have been developed specifically for laboratory and R&D. Designed for a variety of photolithography chemicals, LabSpin systems provide uniform, precise and repeatable spin coating results on the wafer through its advanced process chamber design.文件
无文件
类别
Coaters & Developers
上次验证： 16 天前
物品主要详细信息
状况：
New
运行状况:
Deinstalled
产品编号：
128427
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SUSS MicroTec / KARL SUSS
LABSPIN6
类别
Coaters & Developers
上次验证： 16 天前
物品主要详细信息
状况：
New
运行状况:
Deinstalled
产品编号：
128427
晶圆尺寸：
未知
年份：
未知
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
Laboratory Spin Coat and Develop Solution for Wafers up to 150 and 200mm SUSS MicroTec‘s LabSpin platform represents the next generation of manual spin coater and developer systems that have been developed specifically for laboratory and R&D. Designed for a variety of photolithography chemicals, LabSpin systems provide uniform, precise and repeatable spin coating results on the wafer through its advanced process chamber design.文件
无文件