说明
(5C/ 5D) (for Nikon S609B Immersion Scanner)配置
(5C/ 5D) (for Nikon S609B Immersion Scanner)OEM 型号描述
The CLEAN TRACK LITHIUS i+ is a 300-mm/200-mm coater/developer designed for technology nodes 45-nm and beyond. It was developed based on three concepts: improved processing, short cycle times, and enhanced network solutions. The system achieves increased responsiveness and stability for important process technologies, shorter lead and start-up times, and allows for easier modifications. It is designed with a metrology integration block and offers an increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC. The CLEAN TRACK LITHIUS i+ supports a throughput of 150 WPH (wafer per hour) and features a thermally isolated design that minimizes thermal interference. It comes standard with the core network solution “Ingenio,” a data analysis platform, and allows for full system integration of measurement and inspection tools. The CLEAN TRACK LITHIUS i+ is specifically developed for immersion technology and is suitable for lithography processes such as ArF immersion, ArF, KrF, and i-line.文件
无文件
TEL / TOKYO ELECTRON
LITHIUS i+
已验证
类别
Coaters & Developers
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
75743
晶圆尺寸：
12"/300mm
年份：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
LITHIUS i+
已验证
类别
Coaters & Developers
上次验证： 16 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
75743
晶圆尺寸：
12"/300mm
年份：
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
(5C/ 5D) (for Nikon S609B Immersion Scanner)配置
(5C/ 5D) (for Nikon S609B Immersion Scanner)OEM 型号描述
The CLEAN TRACK LITHIUS i+ is a 300-mm/200-mm coater/developer designed for technology nodes 45-nm and beyond. It was developed based on three concepts: improved processing, short cycle times, and enhanced network solutions. The system achieves increased responsiveness and stability for important process technologies, shorter lead and start-up times, and allows for easier modifications. It is designed with a metrology integration block and offers an increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC. The CLEAN TRACK LITHIUS i+ supports a throughput of 150 WPH (wafer per hour) and features a thermally isolated design that minimizes thermal interference. It comes standard with the core network solution “Ingenio,” a data analysis platform, and allows for full system integration of measurement and inspection tools. The CLEAN TRACK LITHIUS i+ is specifically developed for immersion technology and is suitable for lithography processes such as ArF immersion, ArF, KrF, and i-line.文件
无文件