概述

CLEAN TRACK™ LITHIUS Pro™ AP for 300mm wafer processing system incorporates fundamental concepts from the widely-installed CLEAN TRACK™ ACT™ 12, with increased focus on providing optimized hardware and processes to support advanced packaging, high viscosity, and spin-on hard mask applications. Additionally, this platform integrates the latest transfer system with alignment capability and compact spin modules from our leading edge CLEAN TRACK™ LITHIUS Pro™ Z to improve productivity, reliability, and yield. CLEAN TRACK™ LITHIUS Pro™ AP adopts key innovations from our CLEAN TRACK™ series, contributes to improve productivities and yields on advanced packaging and other key semiconductor operations.