说明
Multi Block (Resist Coater/Developer)配置
无配置OEM 型号描述
CLEAN TRACK™ LITHIUS Pro™ AP for 300mm wafer processing system incorporates fundamental concepts from the widely-installed CLEAN TRACK™ ACT™ 12, with increased focus on providing optimized hardware and processes to support advanced packaging, high viscosity, and spin-on hard mask applications. Additionally, this platform integrates the latest transfer system with alignment capability and compact spin modules from our leading edge CLEAN TRACK™ LITHIUS Pro™ Z to improve productivity, reliability, and yield. CLEAN TRACK™ LITHIUS Pro™ AP adopts key innovations from our CLEAN TRACK™ series, contributes to improve productivities and yields on advanced packaging and other key semiconductor operations.文件
无文件
类别
Coaters & Developers
上次验证： 9 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
147809
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
LITHIUS Pro AP
类别
Coaters & Developers
上次验证： 9 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
147809
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Multi Block (Resist Coater/Developer)配置
无配置OEM 型号描述
CLEAN TRACK™ LITHIUS Pro™ AP for 300mm wafer processing system incorporates fundamental concepts from the widely-installed CLEAN TRACK™ ACT™ 12, with increased focus on providing optimized hardware and processes to support advanced packaging, high viscosity, and spin-on hard mask applications. Additionally, this platform integrates the latest transfer system with alignment capability and compact spin modules from our leading edge CLEAN TRACK™ LITHIUS Pro™ Z to improve productivity, reliability, and yield. CLEAN TRACK™ LITHIUS Pro™ AP adopts key innovations from our CLEAN TRACK™ series, contributes to improve productivities and yields on advanced packaging and other key semiconductor operations.文件
无文件