说明
Developer Developing machine配置
2DOEM 型号描述
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.文件
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TEL / TOKYO ELECTRON
MARK II
已验证
类别
Coaters & Developers
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
115744
晶圆尺寸：
6"/150mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
MARK II
类别
Coaters & Developers
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
115744
晶圆尺寸：
6"/150mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Developer Developing machine配置
2DOEM 型号描述
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.文件
无文件