说明
Photo Resist配置
PhotoOEM 型号描述
The CLEAN TRACK™ Mark-V is a 30-year-old coater that has revolutionized the concept of conventional photoresist systems. It has introduced various innovative technologies such as a stacked clean oven module layout and high-speed wafer handling robotics, setting worldwide standards for photoresist systems. The Mark-V is capable of handling 75, 100, and 150mm wafers at a rate of 60 wafers per hour and is an open system. It’s an impressive piece of technology!文件
无文件
类别
Coaters & Developers
上次验证： 10 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
139292
晶圆尺寸：
6"/150mm
年份：
1991
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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MARK V
类别
Coaters & Developers
上次验证： 10 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
139292
晶圆尺寸：
6"/150mm
年份：
1991
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Photo Resist配置
PhotoOEM 型号描述
The CLEAN TRACK™ Mark-V is a 30-year-old coater that has revolutionized the concept of conventional photoresist systems. It has introduced various innovative technologies such as a stacked clean oven module layout and high-speed wafer handling robotics, setting worldwide standards for photoresist systems. The Mark-V is capable of handling 75, 100, and 150mm wafers at a rate of 60 wafers per hour and is an open system. It’s an impressive piece of technology!文件
无文件