说明
APCVD Atmospheric Pressure Chemical Vapor Deposition配置
无配置OEM 型号描述
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.文件
无文件
APPLIED MATERIALS (AMAT)
AMS 2100
已验证
类别
CVD
上次验证： 27 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
115776
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
AMS 2100
类别
CVD
上次验证： 27 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
115776
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
APCVD Atmospheric Pressure Chemical Vapor Deposition配置
无配置OEM 型号描述
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.文件
无文件