说明
10/1/26 System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller; Tool will be sold without SoftwareAMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)配置
Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements - 208 V 100.0 A 50/60 Hz 3 PhaseOEM 型号描述
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.文件
无文件
类别
CVD
上次验证： 11 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
148153
晶圆尺寸：
8"/200mm
年份：
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部
APPLIED MATERIALS (AMAT)
CENTURA HDP
类别
CVD
上次验证： 11 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
148153
晶圆尺寸：
8"/200mm
年份：
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
10/1/26 System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller; Tool will be sold without SoftwareAMAT Vita/Delphin Controller Width 1,056.693 in (2,684.0 cm) Depth 986.220 in (2,505.0 cm) Height 944.882 in (2,400.0 cm) Weight 3,748 lb (1,700 kg)配置
Process Gases - PH3, SiH4, NF3, He, Argon, O2 Power Requirements - 208 V 100.0 A 50/60 Hz 3 PhaseOEM 型号描述
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.文件
无文件