说明
无说明配置
Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks, Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process Process Chambers: A,B,C Orienter chamber F System: 1x Mainframe 3x process chamber 1x Controller Rack 1x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) 1x Controller Rack x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller Process Capabilities: High Density Plasma Deposition Software Revision Level: WIN 10 Process Gases: SiH4, NF3, He, Argon, O2 Power Requirements: 208 V 100.0 A 50/60 Hz 3 Phase CE Marked YESOEM 型号描述
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.文件
无文件
类别
CVD
上次验证： 7 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
142476
晶圆尺寸：
8"/200mm
年份：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA HDP
类别
CVD
上次验证： 7 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
142476
晶圆尺寸：
8"/200mm
年份：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process; Process Chambers: A,B,C; Orienter chamber F Software: Win 10 OR 4000 WTM Controller 3x ENI Generator Racks, Chiller INR-498-011D 2x Remote Monitor High Density Plasma Process Process Chambers: A,B,C Orienter chamber F System: 1x Mainframe 3x process chamber 1x Controller Rack 1x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) 1x Controller Rack x Chiller 3x ENI Generator Racks (Converted to separate water supply each Generator) AMAT Vita/Delphin Controller Process Capabilities: High Density Plasma Deposition Software Revision Level: WIN 10 Process Gases: SiH4, NF3, He, Argon, O2 Power Requirements: 208 V 100.0 A 50/60 Hz 3 Phase CE Marked YESOEM 型号描述
The Applied Materials CENTURA HDP (High-Density Plasma) is a semiconductor processing system used for the deposition of high-quality films in advanced semiconductor manufacturing. It is designed to provide precise control over film properties and uniformity, enabling the fabrication of high-performance semiconductor devices.文件
无文件