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APPLIED MATERIALS (AMAT) P5000 CVD
    说明
    无说明
    配置
    - 2 CVD Chamber - Storage elevator - AMAT 0 heat exchanger - OEM 12 RF generators - MFC - Cables - Ran Oxide and Nitride process for 6 inch - Complete, No missing parts
    OEM 型号描述
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    verified-listing-icon

    已验证

    类别
    CVD

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    75238


    晶圆尺寸:

    6"/150mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD
    年份: 1995状况: 二手
    上次验证28 天前

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    已验证
    类别
    CVD
    上次验证: 60 多天前
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    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    75238


    晶圆尺寸:

    6"/150mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    - 2 CVD Chamber - Storage elevator - AMAT 0 heat exchanger - OEM 12 RF generators - MFC - Cables - Ran Oxide and Nitride process for 6 inch - Complete, No missing parts
    OEM 型号描述
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    文件

    无文件

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    查看全部
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