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APPLIED MATERIALS (AMAT) P5000 CVD
    说明
    DXZ Chamber
    配置
    无配置
    OEM 型号描述
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    已验证

    类别
    CVD

    上次验证: 4 天前

    物品主要详细信息

    状况:

    Parts Tool


    运行状况:

    未知


    产品编号:

    142986


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    APPLIED MATERIALS (AMAT) P5000 CVD

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    P5000 CVD

    CVD
    年份: 1995状况: 二手
    上次验证12 天前

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    已验证
    类别
    CVD
    上次验证: 4 天前
    listing-photo-8ad9161c203242b79eaf605eac421f01-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/87021/8ad9161c203242b79eaf605eac421f01/0eb79de0df9b4e838e7ae0aabff78c59_8825338f04084c4f9a18406806b165d91201a_mw.jpeg
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    listing-photo-8ad9161c203242b79eaf605eac421f01-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/87021/8ad9161c203242b79eaf605eac421f01/5fe394af65d94bfb96b3740d274dcb29_f24c13b0eda0483ba7426b181fc7639d1201a_mw.jpeg
    物品主要详细信息

    状况:

    Parts Tool


    运行状况:

    未知


    产品编号:

    142986


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    DXZ Chamber
    配置
    无配置
    OEM 型号描述
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    文件

    无文件

    类似上架物品
    查看全部
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD年份: 1995状况: 二手上次验证:12 天前
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD年份: 1995状况: 二手上次验证:12 天前
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD年份: 0状况: 零件工具上次验证:4 天前