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APPLIED MATERIALS (AMAT) P5000 CVD
    说明
    Metal Etcher. Mini Controller and Heat Exchanger Turbo pump is missing Gas Lines is gone. Metal etching gases are so corrosive and all of them are thrown away when the system is deinstalled RF : ENI 12 , MW : Astex
    配置
    Details attached.
    OEM 型号描述
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    文件
    类别
    CVD

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    31214


    晶圆尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    已验证
    类别
    CVD
    上次验证: 60 多天前
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    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    31214


    晶圆尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Metal Etcher. Mini Controller and Heat Exchanger Turbo pump is missing Gas Lines is gone. Metal etching gases are so corrosive and all of them are thrown away when the system is deinstalled RF : ENI 12 , MW : Astex
    配置
    Details attached.
    OEM 型号描述
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    文件
    类似上架物品
    查看全部