说明
无说明配置
P5000 3 chamber delta DhL Two power supplies per chamber which makes plasma density much greater compared to straight single power supply. Two generators gives and ICP (inductively coupled plasma) environment which creates more reactive species in the plasma.OEM 型号描述
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.文件
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APPLIED MATERIALS (AMAT)
P5000 CVD
已验证
类别
CVD
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
63676
晶圆尺寸:
6"/150mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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查看全部APPLIED MATERIALS (AMAT)
P5000 CVD
类别
CVD
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
63676
晶圆尺寸:
6"/150mm
年份:
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
P5000 3 chamber delta DhL Two power supplies per chamber which makes plasma density much greater compared to straight single power supply. Two generators gives and ICP (inductively coupled plasma) environment which creates more reactive species in the plasma.OEM 型号描述
The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.文件
无文件