说明
System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller; 208 V 100.0 A 50/60 Hz 3 Phase配置
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2OEM 型号描述
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.文件
无文件
类别
CVD
上次验证： 今天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
150735
晶圆尺寸：
8"/200mm
年份：
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA ULTIMA HDP-CVD
类别
CVD
上次验证： 今天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
150735
晶圆尺寸：
8"/200mm
年份：
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
System: 1x Mainframe; 3x process chamber; 1x Controller Rack; 1x Chiller; 3x ENI Generator Racks (Converted to separate water supply each Generator)System: AMAT Vita/Delphin Controller; 208 V 100.0 A 50/60 Hz 3 Phase配置
3 Chambers Process Gases - PH3, SiH4, NF3, He, Argon, O2OEM 型号描述
The Applied Centura Ultima HDP CVD 200mm and 300mm systems deliver a high-density plasma CVD process. It has been the industry-leading workhorse delivering high-quality dielectric films and void-free gapfill. Its reactor enables customers to achieve the productivity, cost-efficiency, and extendibility needed for multi-generation manufacturing.文件
无文件