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AVIZA / WATKINS-JOHNSON WJ-1500
  • AVIZA / WATKINS-JOHNSON WJ-1500
  • AVIZA / WATKINS-JOHNSON WJ-1500
  • AVIZA / WATKINS-JOHNSON WJ-1500
说明
无说明
配置
Bulk list of parts for WJ WJ1500 LIST ATTACHED
OEM 型号描述
WJ 1500 APCVD system processes 200mm wafers addressing design-rule fabrication capability of 0.15 micron. It offers relatively low cost of ownership with a process designed to result in improved reliability, performance and serviceability through enhanced film uniformity, reduced consumables, improved system availability and ultra-low film metal levels. Our 1500 APCVD system provides both doped and un-doped deposition of tetraethylorthosilicate- , or TEOS- , based silicon dioxide and can be utilized in a broad range of dielectric film applications for both logic and memory manufacturing requirements.
文件
类别
CVD

上次验证: 60 多天前

物品主要详细信息

状况:

Parts Tool


运行状况:

未知


产品编号:

82670


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AVIZA / WATKINS-JOHNSON

WJ-1500

verified-listing-icon
已验证
类别
CVD
上次验证: 60 多天前
listing-photo-e79e5d476fbb402289096c9b2dc1ee7b-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Parts Tool


运行状况:

未知


产品编号:

82670


晶圆尺寸:

未知


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
Bulk list of parts for WJ WJ1500 LIST ATTACHED
OEM 型号描述
WJ 1500 APCVD system processes 200mm wafers addressing design-rule fabrication capability of 0.15 micron. It offers relatively low cost of ownership with a process designed to result in improved reliability, performance and serviceability through enhanced film uniformity, reduced consumables, improved system availability and ultra-low film metal levels. Our 1500 APCVD system provides both doped and un-doped deposition of tetraethylorthosilicate- , or TEOS- , based silicon dioxide and can be utilized in a broad range of dielectric film applications for both logic and memory manufacturing requirements.
文件