
说明
APCVD (Chemical Vapor Deposition)配置
无配置OEM 型号描述
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.文件
无文件
类别
CVD
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
119844
晶圆尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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WJ-999R
类别
CVD
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
119844
晶圆尺寸:
8"/200mm
年份:
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
APCVD (Chemical Vapor Deposition)配置
无配置OEM 型号描述
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.文件
无文件