跳至主要内容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多

Moov logo

Moov Icon
AVIZA / WATKINS-JOHNSON WJ-999R
  • AVIZA / WATKINS-JOHNSON WJ-999R
  • AVIZA / WATKINS-JOHNSON WJ-999R
  • AVIZA / WATKINS-JOHNSON WJ-999R
说明
Horizontal furnaces, GIGA TECH cleaning machines, and BAKE are excluded.
配置
无配置
OEM 型号描述
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.
文件

无文件

类别
CVD

上次验证: 28 天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

124712


晶圆尺寸:

6"/150mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

AVIZA / WATKINS-JOHNSON

WJ-999R

verified-listing-icon
已验证
类别
CVD
上次验证: 28 天前
listing-photo-bd95ab72aefd4063a2b3269277b5bed4-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

124712


晶圆尺寸:

6"/150mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Horizontal furnaces, GIGA TECH cleaning machines, and BAKE are excluded.
配置
无配置
OEM 型号描述
The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements.
文件

无文件