Lam Research is a leading supplier of plasma etch- and single-wafer clean equipment that plays a pivotal role in defining the features and capabilities of next-generation semiconductor devices. With the addition of Novellus' innovative thin-film deposition and surface preparation product lines, the new Lam Research is well-positioned within the industry to support critical technology transitions including 3D structures in advanced logic and NAND memory, as well as the scaling to 450 mm wafers.

LAM RESEARCH / NOVELLUS

The ALTUS Max is a tungsten deposition system that provides advanced contact and via fill technology. It is designed to deliver high productivity and is the first ALD tungsten system to achieve a throughput of over 120 wafers per hour. This sets a new benchmark in productivity while maintaining world-class reliability and single-digit 65 nm defect performance. The ALTUS Max is a powerful tool for semiconductor manufacturing.

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

CVD

类似上架物品

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

CONCEPT THREE "C3" ALTUS MAX

CVD

类似上架物品

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX

LAM RESEARCH / NOVELLUS

CONCEPT THREE "C3" ALTUS MAX