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LAM RESEARCH / NOVELLUS CONCEPT TWO "C2" DUAL ALTUS
    说明
    WPLUG
    配置
    无配置
    OEM 型号描述
    Novellus introduced the Concept Two-Dual ALTUS tungsten deposition system in 1994. The Dual ALTUS is designed with a dual-chamber configuration that delivers the throughput power to dramatically lower the cost of tungsten deposition. It is considered the best solution in the industry for very high volume 200mm wafer fabs producing state-of-the-art 0.35um semiconductor devices.
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    类别
    CVD

    上次验证: 28 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    128042


    晶圆尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    LAM RESEARCH / NOVELLUS

    CONCEPT TWO "C2" DUAL ALTUS

    verified-listing-icon
    已验证
    类别
    CVD
    上次验证: 28 天前
    listing-photo-cd6e78639ca441fd8ac3bf6d0aab7146-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    128042


    晶圆尺寸:

    8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    WPLUG
    配置
    无配置
    OEM 型号描述
    Novellus introduced the Concept Two-Dual ALTUS tungsten deposition system in 1994. The Dual ALTUS is designed with a dual-chamber configuration that delivers the throughput power to dramatically lower the cost of tungsten deposition. It is considered the best solution in the industry for very high volume 200mm wafer fabs producing state-of-the-art 0.35um semiconductor devices.
    文件

    无文件