说明
Film Thickness Measurement配置
[Power-on] 2port(TDK), Yaskawa(Aligner, Robot) / *Need to check Fine Z-stage focus(Fail).OEM 型号描述
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.文件
无文件
KLA
SPECTRAFX 200
已验证
类别
Defect Inspection
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
95294
晶圆尺寸：
12"/300mm
年份：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
SPECTRAFX 200
已验证
类别
Defect Inspection
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
95294
晶圆尺寸：
12"/300mm
年份：
2006
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Film Thickness Measurement配置
[Power-on] 2port(TDK), Yaskawa(Aligner, Robot) / *Need to check Fine Z-stage focus(Fail).OEM 型号描述
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.文件
无文件