说明
Thickness measurement配置
无配置OEM 型号描述
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.文件
无文件
类别
Defect Inspection
上次验证： 14 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
129566
晶圆尺寸：
12"/300mm
年份：
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
SPECTRAFX 200
类别
Defect Inspection
上次验证： 14 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
129566
晶圆尺寸：
12"/300mm
年份：
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Thickness measurement配置
无配置OEM 型号描述
The SpectraFx 200 is a thin-film measurement system that uses spectroscopic ellipsometry technology to non-destructively measure process variation on product wafers. It is optimized for 300mm fab-to-fab and tool-to-tool matching and provides enhanced performance on ultra-thin gate oxides, multi-stack, and 193-nm anti-reflective coating layers. It also has a 2D film stress option that measures the entire wafer to generate a 2D wafer map.文件
无文件