概述

The KLA 2135 is a wafer inspection system that uses advanced technology to detect all types of defects on all process layers with high capture rates. It has a two- to three-times throughput improvement over the earlier model KLA 2132 and delivers unmatched speed and sensitivity for in-line monitoring of advanced processes. It consistently detects the widest range of yield-relevant defects at the speeds required for high-volume wafer production.