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KLA 2351
  • KLA 2351
  • KLA 2351
  • KLA 2351
说明
Bright field detection No missing parts Current size : 12
配置
无配置
OEM 型号描述
The KLA / TENCOR 2351 is a Bright-Field Wafer Inspection System. The TENCOR 2351 can be used with 200mm wafer sizes. In July of 2001, an upgrade to the 2350 was introduced, the 2351, which offers enhancements in sensitivity, throughput and ease of use. The KLA 2135 is a wafer inspection system that detects all types of yield-relevant defects on all process layers with high capture rates. It has a two- to three-times throughput improvement over the earlier model KLA 2132 and uses advanced sensor and image processing technologies. The 2135 consistently detects the widest range of defects at the speeds required for high-volume wafer production.
文件

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KLA

2351

verified-listing-icon

已验证

类别
Defect Inspection

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

Deinstalled


产品编号:

107147


晶圆尺寸:

8"/200mm, 12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

2351

verified-listing-icon
已验证
类别
Defect Inspection
上次验证: 60 多天前
listing-photo-ab2de3c4577e45da994776f5b89a617a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

Deinstalled


产品编号:

107147


晶圆尺寸:

8"/200mm, 12"/300mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Bright field detection No missing parts Current size : 12
配置
无配置
OEM 型号描述
The KLA / TENCOR 2351 is a Bright-Field Wafer Inspection System. The TENCOR 2351 can be used with 200mm wafer sizes. In July of 2001, an upgrade to the 2350 was introduced, the 2351, which offers enhancements in sensitivity, throughput and ease of use. The KLA 2135 is a wafer inspection system that detects all types of yield-relevant defects on all process layers with high capture rates. It has a two- to three-times throughput improvement over the earlier model KLA 2132 and uses advanced sensor and image processing technologies. The 2135 consistently detects the widest range of defects at the speeds required for high-volume wafer production.
文件

无文件